LIU, Mingdi, LIANG, Junzhao, WU, Yanxiong, ZHEN, Junrui, XIE, Rui, LUO, Zicong, LUO, Jiaxiong und YAN, Lisong, 2026. Multi-adaptive factor regulated Fourier ptychographic microscopy full-field wavevector correction algorithm. Optics and Laser Technology. 1 Januar 2026. Vol. 193, no. Part B, . DOI 10.1016/j.optlastec.2025.114332.
Elsevier - Harvard (with titles)Liu, M., Liang, J., Wu, Y., Zhen, J., Xie, R., Luo, Z., Luo, J., Yan, L., 2026. Multi-adaptive factor regulated Fourier ptychographic microscopy full-field wavevector correction algorithm. Optics and Laser Technology 193. https://doi.org/10.1016/j.optlastec.2025.114332
American Psychological Association 7th editionLiu, M., Liang, J., Wu, Y., Zhen, J., Xie, R., Luo, Z., Luo, J., & Yan, L. (2026). Multi-adaptive factor regulated Fourier ptychographic microscopy full-field wavevector correction algorithm. Optics and Laser Technology, 193(Part B). https://doi.org/10.1016/j.optlastec.2025.114332
Springer - Basic (author-date)Liu M, Liang J, Wu Y, Zhen J, Xie R, Luo Z, Luo J, Yan L (2026) Multi-adaptive factor regulated Fourier ptychographic microscopy full-field wavevector correction algorithm. Optics and Laser Technology 193. https://doi.org/10.1016/j.optlastec.2025.114332
Juristische Zitierweise (Stüber) (Deutsch)Liu, Mingdi/ Liang, Junzhao/ Wu, Yanxiong/ Zhen, Junrui/ Xie, Rui/ Luo, Zicong/ Luo, Jiaxiong/ Yan, Lisong, Multi-adaptive factor regulated Fourier ptychographic microscopy full-field wavevector correction algorithm, Optics and Laser Technology 2026.