HAN, Tengfei, WANG, Kan, WANG, Jinlai und ZHANG, Qinhe, 2026. Magnetic field-assisted ECDM of Si Cp/Al composites: process optimization and validation. Materials & Manufacturing Processes. 1 Februar 2026. Vol. 41, no. 3, p. 442-451. DOI 10.1080/10426914.2026.2613642.
Elsevier - Harvard (with titles)Han, T., Wang, K., Wang, J., Zhang, Q., 2026. Magnetic field-assisted ECDM of Si Cp/Al composites: process optimization and validation. Materials & Manufacturing Processes 41, 442-451. https://doi.org/10.1080/10426914.2026.2613642
American Psychological Association 7th editionHan, T., Wang, K., Wang, J., & Zhang, Q. (2026). Magnetic field-assisted ECDM of Si Cp/Al composites: process optimization and validation. Materials & Manufacturing Processes, 41(3), 442-451. https://doi.org/10.1080/10426914.2026.2613642
Springer - Basic (author-date)Han T, Wang K, Wang J, Zhang Q (2026) Magnetic field-assisted ECDM of Si Cp/Al composites: process optimization and validation.. Materials & Manufacturing Processes 41:442-451. https://doi.org/10.1080/10426914.2026.2613642
Juristische Zitierweise (Stüber) (Deutsch)Han, Tengfei/ Wang, Kan/ Wang, Jinlai/ Zhang, Qinhe, Magnetic field-assisted ECDM of Si Cp/Al composites: process optimization and validation., Materials & Manufacturing Processes 2026, 442-451.